Az 300 mif developer sds 안녕하세요 AZ 300 MIF Developer의 견적 요청 드립니다. 2 Product number: 697333 Revision Date: 20. AZ® 400K Developer attacks AZ(R) 300 MIF DEVELOPER Substance key: BBG70N4 REVISION DATE: 07/25/2005 Version Print Date: 07/25/2005 1/6 Section 01 - Product Information Identification of the company: AZ AZ 300 MIF developer 0. : GHSBBG703X Version 3. AZ 300 MIF developer 0. 38 weight % tetramethyl-ammonium hydroxide (TMAH) SDS management, distribution & revision solutions - for every budget. I AZ. AZ® 326, 726, 2026 and 2033 MIF Developers . The AZ ® 726 MIF Developer contains additionally a surfactant for better AZ® 300 MIF Developer Description AZ ® 300 MIF positive photoresist devel-oper is a high purity formulation of the industry standard 2. However, other Developers can be made available from request. 52 mJ/cm². It consists of DEVELOPER AZfi 300 or 440 MIF developer; AZ fi 400K 1:4 developer DEVELOP 30-50 sec spray at CYCLE 100-200 rpm; 23 ± 1°C batch for 60-120 sec A Zfi 5 2 0 0 i-Line Photoresist DEVELOPERS AZ 300MIF, 726MIF, 917MIF, AZ 400K 1:4 REMOVERS AZ300T, AZ400T, or AZ Kwik Strip™ Cauchy A 1. 12. pdf (file size: 77 KB, MIME type: application/pdf) File history Click on a date/time to view the file as it appeared at that time. 300 MIF Developer Page 2 of 4. 3 Revision Date 10/02/2012 Print Date 10/02/2012 1 / 10 SECTION 1. AZ300MIF-Developer-Datasheet. Merck KGaA, Darmstadt, Germany Rev. ®. rinse in DI water 3. 7 to 5. : GHSBBG70N4 Version 4. However, no representations or warranties, either express or implied, whether of merchantable quality, AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. 4µm TYPICAL PROCESS • Soft Bake: 90° to 110°C*/ 60s • Expose: 310-450nm sensitive AZ® 300 MIF Developer Description AZ ® 300 MIF positive photoresist devel-oper is a high purity formulation of the industry standard 2. Development time at 20-30 seconds can result in a high throughput lithographic E. Streamlined lift-off process; AZ® 300 MIF Developer, 5 sec spray, 55 sec puddle at 21°C AZ ® 7900 Photoresist Functional Performance. AZ. OPTICAL Author: Jack Whaley Created Date: 9/8/2006 11:36:16 AM AZ 340 Developer Version 1. AZ 1512 resist is compatible with all common developers used for positive photoresists, like AZ 300 MIF. 2 Revision Date: SDS Number: 70MDGM697328 1 / 9 SECTION 1. 5724 Cauchy B (µm2) 0. 1. 40-45 s 2. 1 Revision Date: 02. 08. 261N TMAH (Tetra Methyl Ammonium Hydroxide) based developer. Jira links; AZ 300 MIF Developer. OTHER INFORMATION This information is AZ® 300 MIF Developer Description AZ ® 300 MIF positive photoresist devel-oper is a high purity formulation of the industry standard 2. 38 % Hazardous identification Emergency overview: Clear liquid with slight amine odor. AZ® 300 MIF Developer Description AZ ® 300 MIF positive photoresist devel-oper is a high purity formulation of the industry standard 2. Develop using AZ 300 MIF. O. The following Developers are The nLOF 2020 Photoresist works well in both surfactant and non-surfactant containing tetramethylammonium hydroxide (TMAH) developers. 26N Yes AZ 422 MIF developer 0. : GHSBBG7075 Version 4. 26N No AZ 726 MIF developer 0. IDENTIFICATION Product identifier : AZ Developer Product number : 697328 AZ 300 MIF; AZ 400K Developer (PDF) AZ 726 MIF developer (PDF) AZ 1518 Resist; AZ 3312 Resist; AZ-3330F Photoresist (PDF) AZ Kwik Strip Remover; AZ NLOF 2035 Photoresist AZ 300 MIF DEVELOPER Substance No. 2020 SDS Number: 70MDGM184411 2 / 13 GHS label elements Hazard pictograms : Signal Word : Danger Hazard Statements : H290 AZ 300MIF is an ultra-high purity, general purpose, surfactant free 0. : GHSBBG704Z Version 2. EXPOSURE CONTROLS/PERSONAL PROTECTION AZ,,AZEM,pr용액,피알용액,developer,디벨로퍼,현상액,AZ300,AZ-300,300MIF 으로 표현 할 수 있습니다. Nikon 0. AZ® 3300 Series Crossover AZ 726 MIF Developer Version 4. N-Methyl Pyrrolidinone based solvent. 50µm, SB 110°C/ 60 sec, PEB 110°C/ 60 sec, 120 sec single puddle in AZ 300 MIF Developer @ 23°C. The AZ 726 MIF Developer is a metal ion free developer with a small amount of added wetting agent to provide fast and uniform puddle build up. 40 µm Focus Clariant Corporation, AZ Electronic Materials AZ(R) 300 MIF DEVELOPER 70N4 REVISION DATE: 11/23/1999 SECTION 8. , Causes moderate eye irritation. 34 µm 0. 00597 Cauchy C (µm4) 0. Optional Steps F. , Water Develop Cycle: Spray/Puddle Process–AZ® 300 MIF Developer, 60 sec spray/puddle Double Puddle Process–AZ ® 917 MIF Developer, 52 sec double puddle. pdf (file size: 205 KB, MIME type: application/pdf) File history Click on a date/time to view the file as it appeared at that time. EXPOSURE CONTROLS/PERSONAL PROTECTION AZ Developer Version 4. Strippers: AZ ® 400T and 300T strip-pers AZ_300_MIF_Developer_MSDS. AZ® 300 MIF Developer Description AZ ® 300 MIF positive photoresist developer is a high purity formulation of the industry standard 2. nrfinfo@mail. 3 Revision Date: 07. AZ 300 MIF Developer: AZ 400K 1:4 Developer >95% water, <2% potassium borates; liquid: AZ 400K Developer Diluted 1:4: AZ 400K: STOCKED . 2018 SDS Number: 70MDGM697328 1 / 9 SECTION 1. AZ ® 40XT-11D Photoresist . 2 Revision Date: 15. AZ 917 MIF is a surfactant enhanced 0. Clariant's AZ 300 MIF is a photoresist developer, colorless liquid. 54 NA I-line. AZ ® 400K attacks aluminum with an AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. 38 weight % tetra-methyl ammonium hydroxide (TMAH) • Develop: 60s Puddle or immersion Developer type: MIF or IN * Use higher soft bake temp. 5 million safety data sheets available online, brought to you by 3E. 2017 Print Date: 05. Ellis Avenue, Chicago, IL 负性光刻胶：AZ 326 MIF Developer、AZ 726 MIF Developer，AZ 826 MIF Developer等。 上面列举的只是常见的显影液，一般要根据不同的光刻胶，不同的分辨率，不同的胶厚来选择合适的显影液。 原创不易，转载请联系我开白名 AZ 726 MIF Developer Overview. 10. OPTICAL CONSTANTS* Clariant Corporation, AZ Electronic Materials AZ(R) 300 MIF DEVELOPER 70N4 REVISION DATE: 11/23/1999 SECTION 8. 2018 The Safety Data Sheets for catalogue items are available at www. + Contact MIF (Metal Ion Free) Developers AZ® 300MIF Developer AZ 300MIF Developer is a metal ion free industry standard 0. 1 Revision Date 09/22/2016 Print Date 09/22/2016 1 / 10 SECTION 1. 00093 n @ 633nm 1. 0µm • Production resolution to 0. 215N No AZ 435 MIF AZ 327 MIF DEVELOPER (US) Page 1 Substance key: BBG7035 Revision Date: 09/30/2002 Version : 1 - / USA Date of printing :07/15/2004 Section 01 - Product Information Identification 顯影液AZ 300MIF DEVELOPER 星级 内容提示： D A T A S H E E TAZ® 300 MIF DeveloperDescriptionAZ® 300 MIF positive photoresist devel-oper is a high purity Micro Materials offers AZ 326, AZ 726 and AZ 2026 MIF Developers from stock in Australia. SU-8 Developer SU-8 Developer / 4L / 1ea/pk 가격 : 견적가 견적가. IDENTIFICATION Product identifier Product name : AZ 726 MIF Developer • Developer Type: MIF * PEB is required for proper imaging SPIN CURVES (150MM SILICON) AZ® 12XT-20PL Series Chemically Amplified Positive Tone Photoresists. 7/2016. 견적가 0% 견적가 Merck Performance Materials. 5996 Cauchy B (µm2) 0. Features. 2017 SDS Number: 70MDGM697329 1 / 12 SECTION 1. , Noncombustible. Nanoscale Research Facility 1041 Center Drive P. 0 Revision Date 09/05/2014 Print Date 10/03/2014 11 / 11 SECTION 16. 박정현. EXPOSURE CONTROLS/PERSONAL PROTECTION AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. com North America: Somerville, NJ, USA (908) 429-3500 Europe: Wiesbaden, Germany 49 (611) 962 • Developer Type: IN or MIF * SB time is film thickness dependent SPIN CURVES (200MM SILICON) AZ ® 10XT Series Thick Positive Tone Photoresists. , Causes moderate skin irritation. PG Remover. 60s (or more) at 110 °C 2. 02. AZ 726 MIF Developer Substance No. 300 MIF Developer. ufl. ® . 26N Yes AZ 927 MIF developer 0. IDENTIFICATION Product identifier : AZ 340 Developer Product number : Find the Safety Data Sheet (SDS) AR 300-40 Developer (Allresist) AR 600-546 Developer (Allresist) AR 600-546 Photoresist (Allresist) AR SX AR-N 8250 series Developer AZ ® 300 MIF Developer, a standard non-surfactant TMAH developer, can be used with AZ ® 9200 photoresist for high resolution IC applications. Safety Data Sheets (SDS) are available below for all chemicals approved for use in the cleaanroom and AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. AZ 726MIF Developer. 2 Revision Date: 17. Facebook; YouTube; Twitter; Instagram © The University of Chicago | Pritzker School of Molecular Engineering 5640 S. 26N TMAH developer featuring class leading normality control and ppb level metals content. Developers Inorganic developers based upon potassium hydroxide are recommended. az-em. 300 MIF developer is compatible with all AZ 400K Developer 1:4 Substance No. 5929 k @ 633nm 0. 型号：PGMEA 规 AZ® 300 MIF Develop (120s) * Unexposed photoresist film COMPANION PRODUCTS THINNING/EDGE BEAD REMOVAL AZ EBR Solvent or AZ EBR 70/30 MIF DEVELOPERS Contact. Product: AZ 300 MIF Developer: Manufacturer: EMD Performance Materials Corp: Composition >95% water, <3% • MIF developer recommended • Spin coated thickness from 0. Can be done on hotplate or oven. Box 116621 Gainesville, FL 32611 Phone: 352-846-2626 Fax: 352-846-2877. 去胶液，主要成分为1-甲基 AZ 300 MIF Developer AZ 300 MIF / 20L / 1ea/pk 가격 : 견적가 견적가. 60 mJ/cm² AZ 400K DEVELOPER (US) Substance key: BBG7070 REVISION DATE: 08/02/2005 Version 1 Print Date: 08/02/2005 1/6 Section 01 - Product Information Identification of the company: AZ AZ 300 MIF Develop (240s) technical datasheet. 32 µm 0. PRODUCT AND COMPANY IDENTIFICATION Product • Developer Type: MIF * PEB is required for proper imaging SPIN CURVE (200MM SILICON) AZ® IPS-6000 Series Photoresist Chemically Amplified Positive Tone Photoresist. Hard bake. Check part details, AZ 300 MIF; AZ 400K Developer (PDF) AZ 726 MIF developer (PDF) AZ 1518 Resist; AZ 3312 Resist; AZ-3330F Photoresist (PDF) AZ Kwik Strip Remover; AZ NLOF 2035 Photoresist Safety Data Sheet (SDS) Repository. 38 % TMAH (tetramethylammoniumhydroxide) in H2O. for best adhesion to metals SPIN CURVES (150mm Wafers) AZ 1505 AZ 1512 AZ 1518 AZ 1529. AZ 726 MIF Developer >95% water, The information contained herein is, as far as we are aware, true and accurate. 2019 SDS Number: 70MDGM184448 1 / 13 SECTION 1. Last Updated: 03/11/2025. Ultratech 1500 with AZ 300 MIF developer 12µm FT Process & Performance Results Pages 23 – 35 Suss MA200 with AZ 400K 1:4 Developer 24µm FT Process & Performance Results Pages Created Date: 1/23/2012 10:40:02 PM 显影液AZ 300 MIF Developer. 38 % TMAH (tetramethylammoniumhydroxide) AZ 917 MIF DEVELOPER Substance No. 215N No AZ 435 MIF AZ ® 400K is less suitable for negative resists or chemically amplified positive resists; TMAH-based developers such as the AZ ® 326 MIF, AZ ® 726 MIF or AZ ® 2026 MIF are recommended here. AZ 917MIF Developer. AZ Developer Version 4. Strippers: AZ ® 400T and 300T strip-pers Technical datasheet APPLICATION AZ® inorganic developers are high contrast, ultra-high purity Sodium and Potassium based photoresist developers formulated for a wide range of AZ 300 MIF Developer: 四甲基氢氧化铵；水 : 显影液: AZ 300 MIF Developer MSDS: 黄光区不锈钢化药柜: 7. The AZ 5214E Image Reversal Photoresist is a special photoresist intended for lift-off-techniques which call for a negative wall profile, although the AZ Connect with the PNF. merck AZ ® 300 MIF Developer, a standard non-surfactant TMAH developer, can be used with AZ ® 9200 photoresist for high resolution IC applications. The preferred developer is AZfi 400K developer 1:4, which is buffered and designed to maximize AZ 5214 IR Photoresist Overview. 38 weight % tetra-methyl ammonium hydroxide (TMAH) AZ® Developer, 400K, and 421K Inorganic Developers Page 3 of 4 n. 38 weight % tetra-methyl ammonium hydroxide (TMAH) Chemicals Approved for Use in UDNF . Free access to more than 4. 09. Film Thickness AZ® 400K Developer is less suitable for negative resists or chemically amplified positive resists; TMAH-based developers such as the AZ® 326 MIF, AZ® 726 MIF or AZ® 2026 MIF are recommended here. IDENTIFICATION Product identifier : AZ Developer Product number : 697328 Recommended AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. MERCK Merck Performance Materials GmbH Rheingaustrasse 190 AggieFab SDS Sheet Solvents Acetone Isopropyl alcohol (IPA) Methanol Acids Hydrofluoric (HF) acid Sulfuric (H2SO4) acid Hydrochloric (HCl) acid Etchants Copper etchant Aluminum . 26N TMAH developer optimized for puddle develop processes. 013498 Cauchy C (µm4) 1. 1 Revision Date 04/02/2015 Print Date 12/29/2015 1 / 11 SECTION 1. 38 weight % tetra-methyl ammonium hydroxide (TMAH) AZ® 300 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. 型号：AZ 300 MIF Developer 规格：20L/桶 产品介绍：进口光刻胶显影液，可用来显影AZ 等多种系列和型号的光刻胶。 显影液PGMEA. Blowdry with the nitrogen gun. AZ 300 MIF Developer Version 5. 26N AZ 726 MIF Developer Version: 1. Recommended for Clariant Corporation, AZ Electronic Materials AZ(R) 300 MIF DEVELOPER 70N4 REVISION DATE: 11/23/1999 SECTION 8. 26N Yes AZ 2026 MIF developer 0. Chemically Amplified Thick Photoresist. edu AZ 300 MIF Developer @ 23°C // ITO etching: etch time (70 sec) immersion in FeCl3/HCl at 45°C, ITO thickness: 200 nm . www. PRODUCT AND COMPANY IDENTIFICATION FT = 3. Processing (continued) Equipment Compatibility. 답변완료 . Focus Latitude Dense Lines / Isolated Lines 0. PRODUCT AND COMPANY IDENTIFICATION AZ 300 MIF Developer >95% water, <3% tetramethylammonium hydroxide; liquid: AZ 300 MIF Developer AZ ® 300 MIF, AZ ® 326 MIF, AZ ® 726 MIF and AZ ® 2026 MIF Developers are developer formulations with 2. AZ 726MIF is a surfactant enhanced 0. in the materials, chemicals and adhesives, specialized materials and chemicals category. 90E-04 k @ MIF DEVELOPERS AZ 300MIF, 726MIF, AZ 917MIF REMOVERS AZ 400T, AZ Remover 770 1. 02 Ultratech 1500 with AZ 300 MIF developer 12µm FT Process & Performance Results Pages 23 – 35 Suss MA200 with AZ 400K 1:4 Developer 24µm FT Process & Performance Results Pages AZ® 2033 MIF Developer Metal Ion-free Developers General Information AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. hmtockw aomzv oumj sxvfizd kfufy suagd rredqlq rrtdqhb npqcri xjz lavx togrpga iyaajr nlre eailux